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Reportstack has announced a new publication on Global Rapid Thermal Processing Equipment Market 2015-2019. t
Manufacture of semiconductors involves semiconductor silicon wafer production, wafer processing, assembly, and testing. Rapid thermal processing refers to the heating of silicon wafers to temperatures above 2,192 degree Fahrenheit within seconds to attain nitridation, dopant activation, metal reflow, thermal oxidation, and chemical vapor deposition within the silicon wafers of a semiconductor. Silicon wafers are heated using either lamps or lasers. Rapid thermal processing equipment offers advantages such as lower power consumption and cost savings. Rapid thermal annealing equipment is used to activate dopants in the wafer and for interfacial reaction of metal contacts. Rapid thermal processing has been gaining popularity among semiconductor manufacturers because of its use in circuit processing, CMOS production, and in the Microelectronics industry.
Analysts forecast the Global Rapid Thermal Processing Equipment market to grow at a CAGR of 3.56 percent over the period 2014-2019.
Covered in this Report
The Global Rapid Thermal Processing Equipment market can be segmented into three based on type: Lamp-based, Laser-based, and Susceptor-based rapid thermal processing equipment. The major end-users of rapid thermal processing equipment are specialist semiconductor manufacturers.
The report, Global Rapid Thermal Processing Equipment Market 2015-2019, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the Americas, and the APAC and EMEA regions; it also covers the Global Rapid Thermal Processing Equipment market landscape and its growth prospects in the coming years. The report includes a discussion of the key vendors operating in this market.
• Applied Materials
• Hitachi Kokusai Electric
• Mattson Technology
• Screen Holdings