World Photomask Market Research and Analysis Report 2020

Global Photomask Market 2016-2020 report is the latest addition to RnRMarketResearch.com industry research reports collection. The report is about 45 pages and provides 18 Exhibits; the report is published in Jan -2016.

The analysts forecast the global photomask market to grow at a CAGR of 2.37% during the period 2016-2020. Photomasks are high-purity quartz or glass plates that contain a pattern of ICs. These are used in the reproduction of pattern structures for manufacturing printed circuit boards, electronic circuits, and LCD displays, and for the serial production of reticles and other microstructures.

Photomasks are used at wavelengths of 365 nm, 248 nm, and 193 nm. ICs are manufactured layer by layer, where each layer requires a unique photomask. As current generation ICs typically have 25-60 layers, the manufacturing process of photomasks has become complex. As a result, EUV wavelengths of 13.5 nm are used for complex photomask manufacturing.

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This report covers the present scenario and the growth prospects of the global photomask market for the period 2016-2020. To calculate the market size, the report considers the revenue generated from sales of photomasks.

The market is divided into the following segments based on geography: APAC, Americas and EMEA

The report, Global Photomask Market 2016-2020, has been prepared based on an in-depth market analysis with inputs from industry experts. This report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.

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Key vendors - Dai Nippon, Toppan Photomasks, Photronics

Other prominent vendors, Compugraphics Photomask Solutions, Hoya, SK Electronics, Taiwan Mask, Nippon Filcon, HTA...